Effects of thermal oxidation and deposition time on the SERS activity of TiO2 nanostructure films

Authors

  • Jutaporn WANNAPHUM Department of Physics, Faculty of Science and Technology, Thammasat University, Pathum Thani, 12121, Thailand
  • Watcharaporn THONGJOON Department of Physics, Faculty of Science and Technology, Thammasat University, Pathum Thani, 12121, Thailand
  • Chantana AIEMPANAKIT Division of Physics, Faculty of Science and Technology, Rajamangala University of Technology Thanyaburi, Pathum Thani, 12110, Thailand
  • Raumporn THONGRUANG Department of Physics, Faculty of Science and Technology, Thammasat University, Pathum Thani, 12121, Thailand
  • Montri AIEMPANAKIT Department of Physics, Faculty of Science, Silpakorn University, Nakhon Pathom, 73000, Thailand
  • Kamon Aiempanakit Department of Physics, Faculty of Science and Technology, Thammasat University, Pathumthani, 12121, Thailand

DOI:

https://doi.org/10.55713/jmmm.v37i1.2702

Keywords:

TiO2 films, DC magnetron sputtering, Thermal oxidation, SERS, OAD

Abstract

Titanium (Ti) nanostructure films were fabricated on glass substrates by DC magnetron sputtering using the oblique angle deposition (OAD) technique with varying deposition times. The as-deposited Ti films were subsequently oxidized in air at 400°C and 500°C to obtain TiO2 nanostructure films. The effects of deposition time and oxidation temperature on the structural, morphological, and optical properties were systematically investigated and correlated with surface-enhanced Raman scattering (SERS) performance toward methylene blue (MB) molecules. Increasing both deposition time and oxidation temperature led to thicker films, larger grains, and enhanced crystallinity with higher surface roughness. The optical band gap gradually decreased as deposition time increased, a trend associated with microstructural evolution and improved crystallinity during thermal oxidation. Among all samples, the TiO2 film oxidized at 400°C with a deposition time of 4 min exhibited the highest Raman enhancement, with a maximum enhancement factor (EF) of approximately 4.00 ± 0.064 (mean ± SD, n = 5), indicating that moderate oxidation promotes optimal nanostructured surface and charge-transfer efficiency. These findings highlight the important role of deposition time and oxidation conditions in governing the SERS activity of TiO2 nanostructure films.

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2026-09-21

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[1]
J. . WANNAPHUM, W. . THONGJOON, C. . AIEMPANAKIT, R. . THONGRUANG, M. . AIEMPANAKIT, and K. Aiempanakit, “Effects of thermal oxidation and deposition time on the SERS activity of TiO2 nanostructure films”, J Met Mater Miner, vol. 37, no. 1, p. e2702, Sep. 2026.

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